Iron Tellurium Alloy
Sputtering TargetChemical Name
Chemical Formula
Purity
99.9%
Composition
50/50 at% Fe:Te
Size
2 inch dia x 0.25 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPFETE2D6T03N
Hazmat
Catalog Number
10873
Description
Comments
Iron telluride targets are used in sputtering processes to deposit thin films for the study of iron-based superconductors and chalcogenide-based electronic devices.
FeTe is utilized in semiconductor research, specifically in the development of topological insulators and high-temperature superconducting thin film layers.
Used as a source material in physical vapor deposition processes to create stoichiometric layers for magnetic and superconducting applications.
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