Gallium Oxide, Sputtering Target, 99.999%, 4 inch dia x 0.125 inch th.

Gallium oxide is utilized as an ultra-wide bandgap semiconductor material for high-power electronics and deep-ultraviolet optoelectronic devices.

Used in the fabrication of solar-blind photodetectors and transparent conducting oxides due to its high transparency in the UV and visible spectrum.

Gallium oxide targets are used in magnetron sputtering processes to deposit thin films for functional coatings and electronic buffer layers.

High-purity Ga2O3 is used as an evaporation source for the deposition of thin films in vacuum systems for optical and electronic applications.

Synthesized into nanowires and nanoparticles for use in gas sensors and catalytic applications due to its high surface-to-volume ratio.