Gallium Iron Magnesium Oxide
Sputtering TargetGallium Iron Magnesium Oxide, Sputtering Target, 99.9%, 1 inch dia x 5 mm th.
Product Specifications
Chemical Name
Chemical Formula
Purity
99.9%
Composition
Size
1 inch dia x 5 mm th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPGAFEMGO31D5T3N
Hazmat
Not hazardous for transportation
Catalog Number
5025
Description
Comments
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Element Name
Gallium Iron Magnesium Oxide
Symbol
GaFeMgO3
Atomic Number
-
Atomic Weight
-
Melting Point
-
Boiling Point
-
Density
-
Crystal Structure
Orthorhombic
Color / Appearance
-
Thermal Conductivity
-
Electrical Resistivity
-
Coefficient of Thermal Expansion
-
Electronegativity
-
Neutron Cross Section
-
Electron Configuration
-
This Product
SPGAFEMGO31D5T3N
Form
Sputtering Target
Purity
99.9%
Composition
-
Size
1 inch dia x 5 mm th.
Quantity Available
pcs
Catalog Number
5025
info
Sputtering
Gallium Iron Magnesium Oxide is used as a sputtering target material for the deposition of multiferroic thin films, which exhibit simultaneous magnetic and electric ordering for advanced electronic devices.
warning
HazMat Classification
Not hazardous for transportation
description
Documentation
Safety Data Sheet (SDS) and Certificate of Analysis (COA) available for download. GHS-compliant labeling provided with all shipments.
local_shipping
Shipping
Shipped via FedEx Ground or UPS. Hazmat surcharges apply. International orders may require export compliance review. Custom packaging available.
verified
Quality Assurance
All products supplied with lot-specific COA including ICP-OES elemental analysis, XRD phase identification, and particle size distribution data.
description
Certificates of Analysis (COA)
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