Gallium Iron Oxide (GFO), Sputtering Target, 99.99%, 1 inch dia x 5 mm th.

Gallium Iron Oxide is used as a sputtering target material to deposit multiferroic thin films that exhibit simultaneous ferrimagnetism and piezoelectricity for advanced electronic sensors.

GFO thin films are utilized in optoelectronic devices due to their unique magnetoelectric properties and tunable bandgap, which are beneficial for magneto-optical switching applications.