Germanium, Sputtering Target, 99.999%, 1.075 inch dia x 0.0385 inch th.

Germanium is a critical semiconductor material used in high-speed transistors, integrated circuits, and silicon-germanium (SiGe) alloys for high-frequency electronics.

Used extensively in infrared optics, including lenses and windows for thermal imaging systems, as well as in fiber-optic systems and solar cells.

Germanium sputtering targets are utilized to deposit thin films for optical coatings, phase-change memory devices, and semiconductor layers.

High-purity germanium is used as an evaporation source for creating thin-film layers in the production of infrared sensors and specialized electronic components.

Applied as a high-refractive-index material in multilayer optical coatings for infrared filters and anti-reflective surfaces.