Germanium Oxide, Sputtering Target, 99.99%, 4 inch dia x 0.125 inch th.

Germanium oxide is used as a dopant in silica fibers for telecommunications and in the manufacturing of wide-angle camera lenses and optical devices due to its high refractive index and low optical dispersion.

Germanium oxide targets are utilized in sputtering processes to deposit thin films for optical coatings and semiconductor device layers.

Used as a high-refractive index material in multilayer optical coatings for infrared optics and anti-reflective applications.

GeO2 is used as a source material in physical vapor deposition processes to create transparent conductive or insulating thin films.