Germanium Antimonide, Sputtering Target, 99.999%, 1 inch dia x 0.125 inch th.

Germanium antimonide is used as a sputtering target material for the deposition of phase-change thin films in optical and electronic data storage devices.

Utilized as a phase-change material in the fabrication of non-volatile memory devices and high-speed semiconductor components.

Applied in the development of infrared optical coatings and photonic devices due to its tunable refractive index and phase-switching properties.