Germanium Antimony Sulfide, Sputtering Target, 99.95%, 2 inch dia x 0.25 inch th.

Germanium Antimony Sulfide is used as a sputtering target material for the deposition of chalcogenide thin films, which are essential for phase-change memory devices and infrared optical components.

This material is utilized in the creation of specialized optical coatings due to its high refractive index and transparency in the infrared spectrum, suitable for thermal imaging and sensing applications.

GeS/Sb2S3 mixtures serve as evaporation sources for thermal or e-beam deposition to produce amorphous chalcogenide glass films used in photonics.