Gallium Titanium Zinc Oxide, Sputtering Target, 99.99%, 2 inch dia x 0.125 inch th.

Gallium Titanium Zinc Oxide is utilized as a high-purity sputtering target material for the deposition of transparent conductive oxide (TCO) thin films.

Used as an amorphous oxide semiconductor material for thin-film transistors (TFTs) in high-resolution display backplanes.

Applied in the fabrication of transparent electrodes and functional layers for optoelectronic devices due to its wide bandgap and tunable electrical properties.