Hafnium Aluminum Alloy, Sputtering Target, 99.9%, 200 mm x 150 mm x 6.35 mm th.

Hafnium aluminum alloy targets are used in physical vapor deposition to create thin films for high-k dielectric layers and diffusion barriers in microelectronic devices.

Used as an additive in superalloys to improve high-temperature oxidation resistance and grain boundary stability.

Utilized in the fabrication of advanced logic and memory chips where hafnium-based aluminates serve as high-permittivity gate dielectrics.