HfO2 + SiO2 assembly, Sputtering Target, 99.95%, 12 inch dia x 0.25 inch th.

HfO2 and SiO2 are used as alternating high-index and low-index layers in multilayer interference filters, anti-reflective coatings, and high-reflectivity mirrors.

Composite or segmented targets of HfO2 and SiO2 are used in magnetron sputtering to deposit thin films with tailored refractive indices or dielectric properties.

These materials are co-evaporated or evaporated sequentially via electron beam to create optical thin films with high damage thresholds for laser applications.

Used in the fabrication of high-k dielectric gates and passivation layers where a specific silicate interface or graded refractive index is required.