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Hafnium Silicon Alloy

Sputtering Target

Tags: Silicide Refractory Material Specialty Inorganics

Product Specifications

Chemical Name

Chemical Formula

HfSi

Purity

99.9%

Composition

Hf/Si (70/30 wt%)

Size

14 inch dia x 0.250 inch th.

EINECS Number

Quantity Available

pcs

CAS Number

Status

Product ID

SPHFSI14D6T3N

Hazmat

Not hazardous for transportation

Catalog Number

18972

Description

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General SpecificationsApplicationsSafety and ShippingCertificates of Analysis (COA)

Element Name

Hafnium Silicon Alloy

Symbol

HfSi

Atomic Number

Atomic Weight

Melting Point

1750 °C

Boiling Point

Density

Crystal Structure

Orthorhombic

Color / Appearance

Gray metallic solid

Thermal Conductivity

Electrical Resistivity

Coefficient of Thermal Expansion

Neutron Cross Section

Electron Configuration

This Product

SPHFSI14D6T3N

Form

Sputtering Target

Composition

Hf/Si (70/30 wt%)

Size

14 inch dia x 0.250 inch th.

Quantity Available

pcs

Catalog Number

18972

info

Sputtering

Hafnium silicide targets are used in physical vapor deposition to create thin films for high-k dielectric layers and gate electrodes in advanced semiconductor devices.

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Semiconductors

Used in the fabrication of metal-oxide-semiconductor (MOS) structures as a precursor for hafnium silicate interfaces to improve thermal stability and electrical performance.

warning

HazMat Classification

Not hazardous for transportation

description

Documentation

Safety Data Sheet (SDS) and Certificate of Analysis (COA) available for download. GHS-compliant labeling provided with all shipments.

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Shipping

Shipped via FedEx Ground or UPS. Hazmat surcharges apply. International orders may require export compliance review. Custom packaging available.

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Quality Assurance

All products supplied with lot-specific COA including ICP-OES elemental analysis, XRD phase identification, and particle size distribution data.

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Certificates of Analysis (COA)

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