Hafnium Yttrium Oxide, Sputtering Target, 99.95%, 6 inch dia x 0.25 inch th.

Hafnium Yttrium Oxide is used as a sputtering target material to deposit high-k dielectric thin films and ferroelectric layers in advanced semiconductor devices.

Utilized in the production of high-refractive index optical coatings that require high thermal stability and durability in harsh environments.

Applied as a thermal barrier coating (TBC) material for aerospace and gas turbine components due to its high melting point and low thermal conductivity.

Used as a source material in physical vapor deposition processes to create protective and functional oxide layers.

Employed in the manufacture of specialized refractory components that must withstand extreme temperatures and corrosive environments.