Holmium, Sputtering Target, 99.95%, 2 inch dia x 0.125 inch th.

Holmium is utilized for its unique magnetic properties, specifically having the highest magnetic moment of any element, making it essential for flux concentrators and high-strength magnetic field applications.

Holmium metal targets are used in sputtering processes to create thin films for magneto-optical storage devices and specialized electronic components.

Holmium is used as an alloying agent in the production of specialized magnetic alloys and to control the grain structure in certain high-performance metal mixtures.

High-purity holmium is used as an evaporation material in physical vapor deposition to create thin films for optical and magnetic research applications.