Indium-Gallium-Zinc Oxide
Sputtering TargetIndium-Gallium-Zinc Oxide, Sputtering Target, 99.99%, 1 inch dia x 0.250 inch th.
Product Specifications
Chemical Name
Chemical Formula
Purity
99.99%
Composition
1:1:1 mol% In2O3:Ga2O3:ZnO
Size
1 inch dia x 0.250 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
151248-91-8
Status
Product ID
SPIGZO1D6T04N
Hazmat
Catalog Number
3904
Description
Yellow
Comments
RD~70-80%, microelectronics grade
Semiconductors
Used as a channel material for thin-film transistors (TFTs) in high-resolution flat panel displays and OLED screens due to its high electron mobility.
Sputtering
Fabricated into high-purity ceramic targets for the deposition of thin films via magnetron sputtering in the manufacturing of transparent conductive oxides.
Optoelectronics
Utilized in the production of transparent electronics and flexible displays where high transparency and electrical conductivity are required.
HazMat Classification
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