Indium-Gallium-Zinc Oxide
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
1:1:1 mol%
Size
3 inch dia x 0.25 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
151248-91-8
Status
Product ID
SPIGZO3D6T04N-3
Hazmat
Catalog Number
8108
Description
Gray
Comments
Microelectronics grade
Used as a channel material for thin-film transistors (TFTs) in high-resolution flat panel displays and OLED screens due to its high electron mobility.
Fabricated into high-purity ceramic targets for the deposition of thin films via magnetron sputtering in the manufacturing of transparent conductive oxides.
Utilized in the production of transparent electronics and flexible displays where high transparency and electrical conductivity are required.
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