Indium-Gallium-Zinc Oxide, Sputtering Target, 99.99%, 3 inch dia x 0.25 inch th.

Used as a channel material for thin-film transistors (TFTs) in high-resolution flat panel displays and OLED screens due to its high electron mobility.

Fabricated into high-purity ceramic targets for the deposition of thin films via magnetron sputtering in the manufacturing of transparent conductive oxides.

Utilized in the production of transparent electronics and flexible displays where high transparency and electrical conductivity are required.