Indium Oxide, Sputtering Target, 99.995%, 3 inch dia x 0.125 inch th.

Indium oxide is used as a sputtering target material, often doped with tin oxide (ITO), to create transparent conductive oxide thin films for touchscreens and flat panel displays.

Utilized in the fabrication of optoelectronic devices such as solar cells and LEDs due to its high transparency in the visible spectrum and electrical conductivity.

Acts as an n-type semiconductor material used in thin-film transistors and gas sensors.

Applied as a thin film coating to provide specific refractive index properties and antistatic functions in precision optical components.

Used as a source material in physical vapor deposition processes to deposit thin layers for electronic and optical applications.