Indium oxide-Molybdenum, Sputtering Target, 99.99%, 2 inch dia x 0.25 inch th.

Indium oxide-molybdenum (IMO) is used as a sputtering target material to deposit high-mobility transparent conductive oxide (TCO) thin films for advanced display and photovoltaic technologies.

Used in the fabrication of optoelectronic devices where high near-infrared transparency and high carrier mobility are required, such as in solar cells and touch panels.

Acts as a wide-bandgap semiconductor material for thin-film transistors (TFTs) requiring superior electronic transport properties compared to standard ITO.