Indium Oxide-Gallium Oxide, Sputtering Target, 99.99%, 3 inch dia x 0.25 inch th.

Indium Oxide-Gallium Oxide (IGO) is used as a sputtering target material to deposit thin-film transistors (TFTs) and transparent conductive oxides in display technologies.

Used as a wide-bandgap oxide semiconductor material for high-performance thin-film transistors and optoelectronic devices.

Applied in the fabrication of transparent electrodes and active layers for flat panel displays and solar cells due to its high transparency and tunable electrical properties.