Indium Tin Zinc Alloy
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
1/4/4 mol% In:Sn:Zn
Size
3 inch dia x 6 mm th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPINSNZN3D6T4N-1
Hazmat
Catalog Number
8843
Description
Comments
Indium Tin Zinc alloys are used as sputtering targets to deposit amorphous oxide semiconductor thin films, such as ITZO, for high-performance thin-film transistors.
Used in the fabrication of transparent conducting oxides and channel layers in thin-film transistors for advanced display technologies.
Applied as a transparent electrode material in optoelectronic devices due to its high optical transparency and electrical conductivity.
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