Indium Zinc Alloy
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
90:10 wt%
Size
4 inch dia x 0.125 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPINZN4D3T04N
Hazmat
Powder: Primary Class 4.3, Secondary Class 4.2, UN3189, PG II
Catalog Number
3470
Description
Comments
Indium zinc alloy targets are used in physical vapor deposition to create amorphous indium zinc oxide (IZO) thin films for transparent conductive coatings.
Used in the fabrication of transparent conducting electrodes for liquid crystal displays and organic light-emitting diodes.
Applied as a dopant source or as a component in the formation of ohmic contacts and thin-film transistors.
Utilized as a source material in thermal or e-beam evaporation processes to deposit thin metallic or alloyed layers for electronic circuitry.
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