Iridium, Sputtering Target, 99.95%, 76.2 mm dia x 1 mm th.

Iridium sputtering targets are used to create high-performance thin films for microelectronics and sensors due to the metal's exceptional corrosion resistance and stability.

Iridium is used as a high-purity evaporation material in physical vapor deposition processes to create reflective coatings and protective layers.

Iridium is added to platinum and other metals to significantly increase hardness and resistance to chemical attack in high-temperature environments.

Due to its high melting point and chemical inertness, iridium is used to manufacture crucibles for growing high-quality single crystals at extreme temperatures.