Iridium Manganese Alloy
Sputtering TargetChemical Name
Chemical Formula
Purity
99.9%
Composition
25:75 at% Ir:Mn
Size
2 inch dia x 0.125 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPIRMN2D3T03N
Hazmat
Powder: Class 4.1, UN3089, PG III
Catalog Number
8516
Description
Comments
Iridium Manganese is frequently used as a sputtering target material to deposit antiferromagnetic thin films for exchange bias in magnetic tunnel junctions and spin-valve sensors.
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