Indium Tin Oxide (Fe doped), Sputtering Target, 99.99%, 2 inch dia x 0.125 inch th.

Fe-doped ITO targets are used in magnetron sputtering processes to deposit dilute magnetic semiconductor (DMS) thin films that combine transparency with tunable magnetic properties.

Used as a transparent conducting oxide (TCO) with modified carrier concentration and magnetic functionality for advanced optoelectronic devices and spintronics.

Acts as a wide-bandgap n-type semiconductor where iron doping introduces localized magnetic moments for research into spin-polarized electron transport.