Chemical Name
Indium Oxide-Tungsten Oxide
Chemical Formula
In2O3-WO3
Purity
99.99%
Composition
80:20 wt%
Size
2 inch dia x 0.125 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPIWO2D3T004N
Hazmat
Not hazardous for transportation
Catalog Number
5892
Description
Comments
Indium Oxide-Tungsten Oxide (IWO) is used as a sputtering target material to deposit high-mobility transparent conductive oxide (TCO) thin films for advanced display technologies.
IWO thin films are utilized in optoelectronic devices such as OLEDs and solar cells due to their high transparency in the visible spectrum and superior carrier mobility compared to standard ITO.
Used as a channel material in thin-film transistors (TFTs) for high-resolution flat panel displays and semiconductor circuitry requiring high field-effect mobility.
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