Chemical Name
Indium Oxide-Tungsten Oxide
Chemical Formula
In2O3-WO3
Purity
99.99%
Composition
99:01 wt%
Size
MRC (4.75 inch x 14.875 inch x 0.250 inch th.)
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPIWOMRC0004N
Hazmat
Not hazardous for transportation
Catalog Number
7201
Description
Comments
Indium Oxide-Tungsten Oxide (IWO) is used as a sputtering target material to deposit high-mobility transparent conductive oxide (TCO) thin films for advanced display technologies.
IWO thin films are utilized in optoelectronic devices such as OLEDs and solar cells due to their high transparency in the visible spectrum and superior carrier mobility compared to standard ITO.
Used as a channel material in thin-film transistors (TFTs) for high-resolution flat panel displays and semiconductor circuitry requiring high field-effect mobility.
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