Indium Zinc Oxide, Sputtering Target, 99.99%, 25 mm dia x 10 mm th.

Indium Zinc Oxide is used as a high-purity sputtering target to deposit transparent conductive oxide (TCO) thin films for flat panel displays and touch sensors.

Used as a transparent electrode material in organic light-emitting diodes (OLEDs) and solar cells due to its high transparency and excellent electrical conductivity.

Applied as a channel material in thin-film transistors (TFTs) for high-resolution liquid crystal displays and next-generation semiconductor devices.

Utilized in the production of anti-reflective and heat-reflective coatings where high optical transmission in the visible spectrum is required.