Indium Zinc Tin Oxide, Sputtering Target, 99.99%, 3 inch dia x 3 mm th.

Indium Zinc Tin Oxide is used as a sputtering target material to deposit high-mobility transparent conducting oxide (TCO) thin films for advanced display technologies.

Used as a high-performance channel material in thin-film transistors (TFTs) due to its superior carrier mobility and stability compared to conventional IGZO.

Applied as a transparent electrode in organic light-emitting diodes (OLEDs) and solar cells to improve light extraction and electrical efficiency.