Lanthanum, Sputtering Target, 99.95%, 1 inch dia x 0.0625 inch th.

Lanthanum metal is used as a precursor for high-purity lanthanum oxide and as a key component in Mischmetal for various metallurgical and chemical processes.

Lanthanum is added to steel and other alloys to improve ductility, impact resistance, and to scavenge impurities like oxygen and sulfur.

Lanthanum metal targets are used in physical vapor deposition to create thin films for electronic components and specialized optical coatings.

High-purity lanthanum is used as an evaporation source in vacuum deposition processes to create thin films for semiconductor and optical applications.