Lanthanum Copper Oxide, Sputtering Target, 99.9%, 2 inch dia x 0.125 inch th.

Lanthanum copper oxide is utilized as a sputtering target material for the deposition of thin films in the study of high-temperature superconductivity and advanced oxide electronics.

Used in the fabrication of p-type transparent conducting oxides and as a component in complex oxide heterostructures for semiconductor research.