Lanthanum Fluoride, Sputtering Target, 99.998%, 4 inch dia x 0.25 inch th.

Lanthanum fluoride is used in the preparation of lanthanum metal and as a component in fluoride glasses and specialized ceramics.

Used as a high-purity sputtering target material for the deposition of thin films in optical and electronic applications.

Applied as a low-refractive index layer in multilayer optical coatings, particularly for UV and infrared applications due to its wide transparency range.

Utilized as a source material for physical vapor deposition to create protective and functional thin films on optical components.