Lanthanum Gallium Oxide, Sputtering Target, 99.9%, 1 inch dia x 5 mm th.

Lanthanum Gallium Oxide is utilized as a sputtering target material for the deposition of thin films in the fabrication of high-temperature superconducting substrates and advanced dielectric layers.

Used as a high-refractive index material in the production of specialized optical coatings and thin-film heterostructures.