Lanthanum Nickel Oxide (LNO), Sputtering Target, 99.9%, 22 mm dia x 5 mm th.

Lanthanum Nickel Oxide is used as a sputtering target material to deposit conductive oxide thin films for ferroelectric memory devices and electrode layers.

Used as a metallic oxide electrode and buffer layer in semiconductor heterostructures due to its high electrical conductivity and compatible lattice constant.

Investigated as a conductive additive or coating material for cathode surfaces to improve rate capability and cycling stability in lithium-ion batteries.