Magnesium Nitride, Sputtering Target, 99.5%, 3 inch dia x 0.125 inch th.

Magnesium nitride can be used as a target material or formed via reactive sputtering to create nitride-based thin films for research in semiconductor and optical applications.

Used as an additive in the production of high-strength alloys and as a catalyst in the synthesis of other nitrides like cubic boron nitride.