Magnesium Titanate (Magnesium Titanium Oxide), Sputtering Target, 99.99%, 4 inch dia x 0.25 inch th.

Magnesium titanate is used as a sputtering target material to deposit thin films for high-frequency dielectric resonators and microwave components.

Utilized in the production of optical thin films due to its stable dielectric properties and transparency in specific spectral ranges.

Used as a source material in physical vapor deposition processes to create insulating layers in microelectronic devices.