Manganese
Sputtering TargetProduct ID
SPMN1D3T003N5
Hazmat
Powder: 4.1, PG III, UN3089
Catalog Number
5285
Description
Comments
RD~80-90%
Manganese is a critical alloying element in steel and aluminum production to improve strength, hardness, and wear resistance.
Manganese sputtering targets are used to create thin films for magnetic recording heads and giant magnetoresistance (GMR) sensors.
Manganese is a primary component in Lithium Manganese Oxide (LMO) and Nickel Manganese Cobalt (NMC) cathode formulations for high-capacity batteries.
High-purity manganese is used as an evaporation material for the deposition of thin films in electronic and magnetic applications.
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