Manganese
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
Mn
Size
1 inch dia x .25 inch th.
EINECS Number
231-105-1
Quantity Available
pcs
CAS Number
7439-96-5
Status
Product ID
SPMN1D6T0004N
Hazmat
Powder: 4.1, PG III, UN3089
Catalog Number
4630
Description
Comments
RD~80-90%
Manganese is a critical alloying element in steel and aluminum production to improve strength, hardness, and wear resistance.
Manganese sputtering targets are used to create thin films for magnetic recording heads and giant magnetoresistance (GMR) sensors.
Manganese is a primary component in Lithium Manganese Oxide (LMO) and Nickel Manganese Cobalt (NMC) cathode formulations for high-capacity batteries.
High-purity manganese is used as an evaporation material for the deposition of thin films in electronic and magnetic applications.
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