Manganese Nickel Gallium Alloy, Sputtering Target, 99.9%, 1 inch dia x 2 mm th.

Mn2NiGa targets are used in magnetron sputtering to deposit ferromagnetic shape memory alloy thin films for micro-actuators and magnetic sensor applications.

Used in the development of spintronic devices and magnetic semiconductor interfaces due to its unique magnetic properties and potential for spin-polarized current injection.