Manganese
Sputtering TargetManganese, Sputtering Target, 99.95%, 3 inch dia x .125 inch th.
Product Specifications
Chemical Name
Chemical Formula
Purity
99.95%
Composition
Size
3 inch dia x .125 inch th.
EINECS Number
231-105-1
Quantity Available
pcs
CAS Number
7439-96-5
Status
Product ID
SPMN3D3T003N5
Hazmat
Powder: 4.1, PG III, UN3089
Catalog Number
1008
Description
Comments
RD~80-90%
Alloying
Manganese is a critical alloying element in steel and aluminum production to improve strength, hardness, and wear resistance.
Sputtering
Manganese sputtering targets are used to create thin films for magnetic recording heads and giant magnetoresistance (GMR) sensors.
Lithium battery anode and cathode materials
Manganese is a primary component in Lithium Manganese Oxide (LMO) and Nickel Manganese Cobalt (NMC) cathode formulations for high-capacity batteries.
Evaporation materials
High-purity manganese is used as an evaporation material for the deposition of thin films in electronic and magnetic applications.
HazMat Classification
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