Manganese Gallium Alloy, Sputtering Target, 99.9%, 2 inch dia x 0.125 inch th.

Manganese Gallium alloy targets are used in magnetron sputtering to deposit thin films for spintronic devices, leveraging its high perpendicular magnetic anisotropy and low Gilbert damping.

Used as a ferromagnetic semiconductor material or contact layer in the development of spin-transfer torque (STT) based memory and logic circuits.