Manganese Nickel Gallium, Sputtering Target, 99.9%, 1 inch dia x 3 mm th.

Manganese Nickel Gallium targets are used in magnetron sputtering to deposit thin films of ferromagnetic shape memory alloys for micro-actuators and sensor applications.

Used in the development of spintronic devices and magnetic semiconductor research due to its unique ferromagnetic properties and martensitic phase transitions.