Manganese Silicon Alloy
Sputtering TargetChemical Name
Chemical Formula
Purity
99.95%
Composition
50:50 at%
Size
2 inch dia x 0.125 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
7439-96-5/7440-21-3
Status
Product ID
SPMNSI2D3T3N5
Hazmat
Powder: Class 4.1, PG III, UN 3089
Catalog Number
4853
Description
Comments
Manganese silicon is used as a master alloy in the production of specialized steels and non-ferrous alloys to improve hardness, tensile strength, and oxidation resistance.
Manganese silicon targets are utilized in physical vapor deposition processes to create thin films for microelectronic components and protective coatings.
MnSi is studied as a silicide material for potential integration into spintronic devices and semiconductor interfaces due to its unique magnetic and electronic properties.
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