Molybdenum Silicide, Sputtering Target, 99.5%, 3 inch dia x 0.25 inch th.

Mo5Si3 is utilized as a sputtering target material for the deposition of high-temperature silicide thin films used in microelectronics and protective coatings.

Due to its high melting point and oxidation resistance, Mo5Si3 is employed in the formulation of refractory components and structural ceramics for extreme environments.

Mo5Si3 is used in high-temperature applications where structural stability and resistance to creep are required at temperatures exceeding 1000 °C.