Molydenum Germanium Alloy, Sputtering Target, 99.95%, 3 inch dia x 3 mm th.

Molybdenum Germanium alloy is utilized as a sputtering target material for the deposition of thin films in semiconductor and microelectronic applications, often used in the study of amorphous superconducting systems.

MoGe thin films are employed in semiconductor research and device fabrication, particularly for creating ohmic contacts or as barrier layers in integrated circuits.