Molybdenum Niobium
Sputtering TargetChemical Name
Chemical Formula
Purity
99.95%
Composition
90:10 wt%
Size
2 inch dia x 0.250 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPMONB2D6T3N5
Hazmat
4.1, UN3089, PGII
Catalog Number
17908
Description
Comments
Molybdenum Niobium alloy targets are used in magnetron sputtering to deposit thin films for flat panel displays and touch screen sensors, providing high corrosion resistance and specific electrical properties.
Used as a high-strength, corrosion-resistant alloying agent in the production of specialized steels and superalloys for aerospace and chemical processing equipment.
MoNb is utilized in the fabrication of high-temperature structural components due to its high melting point and mechanical stability under extreme thermal stress.
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