Molybdenum Oxide (doped with Cu), Sputtering Target, 99.9%, 2 inch dia x 0.125 inch th.

Copper-doped molybdenum oxide is utilized as a sputtering target material to create thin films with tuned work functions and improved electrical conductivity for electronic device layers.

Used in the fabrication of thin-film layers for organic light-emitting diodes (OLEDs) and solar cells where Cu-doping enhances hole injection and transport properties.

Applied as a p-type dopant or interfacial layer in semiconductor devices to modulate the electronic band structure and improve carrier mobility.