Molybdenum Tungsten, Sputtering Target, 99.95%, 3 inch dia x 0.25 inch th.

Molybdenum-tungsten alloy targets are used in physical vapor deposition to create thin films for flat panel displays and microelectronics.

Used as an alloying agent to enhance the corrosion resistance and high-temperature strength of specialized steels and superalloys.

Utilized in the manufacturing of furnace components and glass melting electrodes due to its high melting point and stability.

Used as a source material in vacuum evaporation processes to deposit refractory metallic coatings.