Niobium Oxide, Sputtering Target, 99.95%, 4 inch dia x 0.125 inch th.

Niobium oxide is utilized as a high-purity sputtering target material to deposit thin films with high refractive indices and excellent chemical stability for optical and microelectronic devices.

Used as a high-refractive index layer in multilayer interference filters, anti-reflective coatings, and electrochromic devices due to its transparency in the visible and near-infrared spectrum.

Niobium oxide serves as a source material for physical vapor deposition processes to create durable dielectric coatings on glass and plastic substrates.

Investigated as an intercalation anode material (specifically Nb2O5 and NbO2) due to its high rate capability and structural stability during lithium-ion cycling.