Niobium Silicide, Sputtering Target, 99.5%, 4 inch dia x 0.125 inch th.

Niobium silicide is used as a sputtering target material to create thin films for microelectronics and protective coatings due to its high-temperature stability and oxidation resistance.

Utilized as a high-performance refractory material in aerospace and industrial furnace components where resistance to extreme thermal environments is required.

Applied in the development of high-temperature structural ceramics and intermetallic composites that maintain mechanical integrity at elevated temperatures.