Neodymium Nickel Oxide, Sputtering Target, 99.9%, 1 inch dia x 0.250 inch th.

Neodymium Nickel Oxide is used as a sputtering target material to deposit thin films for the study of metal-insulator transitions and strongly correlated electron systems.

Utilized in research for next-generation semiconductor devices, specifically for its unique electronic phase transitions that can be triggered by temperature or strain.

Synthesized as nanostructured thin films or powders to investigate size-dependent effects on the electronic and magnetic properties of perovskite nickelates.